Slow Pull and Infrared Dryer is a hot water slow pull drying devi-ce designed specifically for the semiconductor industry, primari-ly used for wafer cleaning and drying processes. The equipment includes a hot water rinsing tank, a quartz infrared lamp tube + nitrogen drying tank,and a lifting mechanism,compatible with 4, 6, 8, and 12-inch wafers. Through the combination of hot water rinsing, infrared heating, and nitrogen drying, it ensures conta-mination-free and damage-free drying of wafers, meeting high cleanliness standards. The device supports full automation inte-gration and can be seamlessly embedded into fully automated production lines, enhancing production efficiency and process stability.